Mark Reynolds
Since 1975 STS-Elionix has made significant contributions to the field of fabrication measurement, and analysis. Elionix has installed over 400 electron beam lithography systems (EBL) world-wide.
The experiments with electron beam lithography are done with utmost care. All the steps are very crucial and must be performed with
Electron Beam Lithography (EBL) is used to create the remarkably tiny patterns the current electronics industry needs for integrated circuits. This is understandable because electrons have petite spot sizes, while optical lithography’s resolution is limited by the wavelength of light applied for exposure. The wavelength of the electron beam is so short that diffraction no longer dictates the lithographic resolution.
Vector scanning, the electron beam lithography can be adjusted to scan exactly those surfaces which need to be scanned.
Electron Beam Lithography technology refers to a lithographic method for direct writing which employs a focused electron
E-Beam Lithography may also be utilized to fabricate molds, especially for structures in the nanoscale range.
Since 1975 STS-Elionix has made significant contributions to the field of fabrication measurement, and analysis. Elionix has installed over 400 electron beam lithography systems (EBL) world-wide.
